Used OPTORUN OTFC-1300CGI #9408415 for sale

OPTORUN OTFC-1300CGI is a photoresist equipment designed to provide high resolution, reliable photoresist coating processes in a cost-effective manner. It offers a variety of coating modes, allowing users to quickly and easily coat substrates with high uniformity and accuracy. The system also supports a wide range of photoresist materials, allowing users to find the appropriate photoresist for their application. The unit is composed of a laser scan head and an array of lenses and mirrors, both managed by an adjustable galvo scanning machine. This greatly reduces cost, space and power consumption, while still offering the same precision and accuracy. The tool also allows for a highly uniform, continuous coating over a large area and is capable of running at speeds up to 5 m/s. The asset utilizes a three-tier resist coating process, with a direct resist patterning on the surface of the wafer. By using a three-tier resist process, it ensures uniformity, accuracy and repeatability for complex patterning. The model consists of a galvanometer, a laser, an illuminator, and an imaging equipment. The galvanometer moves the illuminator and laser in a specific pattern over the wafer's surface in order to generate the desired patterns. The water-cooled laser is a high-power diode-pumped solid-state laser. It contains an automated power control system which automatically adjusts the laser power and pulse duration to achieve optimal patterning. The unit is equipped with a high-quality microlens array which reduces distortion in both into and out of the substrate plane. This microlens array also helps to achieve uniformity across a large area. Finally, OTFC-1300CGI is designed with high precision mechanics and precision optics to provide superior film uniformity and accuracy. Based on the coating process, an optional motion controller is available to further improve its accuracy. The machine is capable of achieving high accuracy and repeatability in film uniformities and can pattern complex and large masks.