Used OPTORUN OTFC-1300DB #9382501 for sale

OPTORUN OTFC-1300DB Photoresist Equipment is a highly-advanced programmable integrated platform used to develop advanced nanolithography techniques. This system is compact and provides optimal performance for users who need to develop and fine-tune the photoresist application process. The main component of OTFC-1300DB Photoresist Unit is its automated precision dual-stage heating chamber that ensures precise temperatures are achieved for both pre- and post-developed photoresists. This allows users to achieve the highest level of accuracy for their nanolithography techniques. The machine also features a top-of-the-line pressure and temperature control tool that helps to ensure the development of the photoresists is done correctly. The pressure is adjustable from 0 to 5 Torr, while the temperatures can be programmed to five different levels, including room temperature. OPTORUN OTFC-1300DB Photoresist Asset has a digital screen that can be used to adjust the model settings. The LCD display helps to make sure that the correct parameters are always set. It also allows the user to see the status of the photoresist at any given time. The device also features auto-tune, which helps to adjust the equipment quickly and accurately. This feature ensures that the photoresist is properly absorbed into the substrate and then optimized for the best imaging quality. Finally, OTFC-1300DB Photoresist System comes with a manual so that users can quickly learn how to use all the features. Additionally, the unit comes with a full set of safety protocols so that the user is protected from potential hazards. Overall, OPTORUN OTFC-1300DB Photoresist Machine is an advanced, user-friendly tool that helps users accurately and quickly develop their nanolithography techniques. The automated precision dual-stage heating chamber and the top-of-the-line pressure and temperature control asset ensure optimal performances. Furthermore, the digital display, auto-tune, and safety protocols make sure that users are able to get the most out of their photoresist model.