Used OPTORUN OTFC-1300DBI #9358481 for sale

OPTORUN OTFC-1300DBI is a state of the art, advanced photoresist equipment developed by OPTORUN for precision patterning of substrates in the production of various electronic components. It is suitable for the production of devices utilizing conventional and advanced lithographic processes. This system is `equipped with a dedicated optical head and supports exposure area sizes from 30 x 40cm to 50 x 100cm. The excimer laser allows for finely tuned exposure and allows for various features such as a single shot adaptive focus unit, 6 lithographic modes, variable doses, and high-frequency scanning. This combination of features allows for precision patterning of complex structures in a cost effective manner. OTFC-1300DBI features an optical alignment machine and a set of advanced linear stepper stages that are capable of reaching very high resolutions. Its optics are optimized using a continuous phase shift method to minimize the effects of diffraction. It is also compatible with various substrates including glass, quartz, and semiconductor materials. The tool utilizes the latest lithographic technologies, such as High-Resolution Visible (HRV) Imaging, an advanced feature that provides an enhanced imaging capability for the production of small features. The asset also features a Pattern-On-Pattern (POP) alignment model, which allows for precise alignment of multiple layers of patterns. The POP equipment is capable of managing high resolution requirements, and is suitable for the production of high precision microelectronic structures. OPTORUN OTFC-1300DBI is compatible with various layer and etch processes and is capable of producing wafer sized sheets as well as small parts. Its various features combine to provide users with a photolithography system of high accuracy, reproducibility, and throughput. It is suitable for the production of a variety of electronic devices, such as sensors, integrated circuits, LCDs, OLEDs, and MEMS.