Used OPTORUN OTFC-1550 #9390009 for sale

OPTORUN OTFC-1550 is a fully automated photoresist film processing equipment consisting of a substrate coating and development chamber, viscosity pump, and photo resist dispenser. OPTORUN OTFC 1550 offers a reliable and repeatable way of processing photomask-bearing substrates ranging in size from 200 mm x 200 mm to 500 mm x 500 mm. This system is made up of a set of chambers, with a dedicated chamber for each process step, including substrate coating and development, pre-bake, dispense, post-bake, and finally, a photo resist removal chamber. OTFC-1550 begins with an automated substrate coating chamber where the photoresist is applied in a uniform film thickness to the substrate. This chamber also has the ability to perform pre-bake processes, ensuring a uniform base film adhesion. Dispense function is used to ensure that the photomask pattern is accurately dispensed onto the substrate at the desired thickness. This is achieved via an advanced photo resist dispenser that is integrated within the unit. Post-bake processes such as exposure and development are carried out in the integrated development chamber. This chamber helps ensure a uniform, overall resist film profile. Finally, the Photo Resist Removal (PRR) chamber is used to remove unwanted photoresist from the substrate. This is made possible via advanced, vacuum-assisted technology which has been designed to ensure uniform PRR results. Overall, OTFC 1550 photoresist machine offers a reliable and repeatable substrate processing solution. It is capable of processing photomask-bearing substrates ranging in size from 200 mm x 200 mm to 500 mm x 500 mm. Additionally, its integrated pre-bake, dispense, post-bake, and PRR processes enable precise and uniform photoresist film processing results.