Used OPTORUN OTFC-1800 #9263756 for sale

OPTORUN OTFC-1800 is a next-generation photoresist processing equipment that offers excellent performance and flexibility for a wide range of applications. This all-in-one system offers users the capability to easily create patterns on substrates using photolithography. The unit features an advanced substrate handling technology, a highly reliable exposure source, and a high precision resist processing module. OTFC-1800 substrate handling technology allows for the processing of substrates up to 36" in length using either standard glass plates or FOUP enclosures. It allows for precise control of substrate placement on the exposure stage, and features high precision, stable, and repeatable stage motion. This ensures that precise geometries can be realized with minimal exposure section alignment artifacts. OPTORUN OTFC-1800 features a highly reliable and reliable deep ultraviolet (DUV) exposure source that offers precise and repeatable pattern exposure. The source can be configured to cover full-field or step-and-repeat exposures, and a variety of power levels to suit specific substrate and resist requirements. It features a large diffraction grating and a wide dynamic range of exposure levels, for a wide range of photolithography applications. OTFC-1800 also features a highly compact, high precision, and low maintenance resist processing module. This module uses VA resist methodologies to ensure high quality resist process results, and can process substrates up to 4" in diameter. It has a temperature maintaining feature that ensures a stable resist evolution during the etching process, and can be configured to maximize process yields for single-layer or multilayer structures. Overall, OPTORUN OTFC-1800 is a versatile and reliable photoresist processing machine that offers excellent performance and flexibility for a wide range of applications. It features an advanced substrate handling technology, a highly reliable exposure source, and a low-maintenance resist processing module to ensure high-precision pattern generation. This makes it an ideal choice for photolithography applications that require complex geometries and high throughput.