Used OPTORUN OTFG-1000C #9359460 for sale

OPTORUN OTFG-1000C is a high-precision photoresist equipment designed for use in a wide variety of processes and applications. The unit's advanced design and features offer users a reliable and cost-effective solution for photolithography, with a high degree of accuracy and repeatability. OTFG-1000C features a large field of view that can accommodate up to 1,000 mm by 1,000 mm frames. The frame is mounted on a linear coordinate-axis platform to provide accurate alignment and positioning for both frame orientation and part placement. Additionally, the unit features integrated vision guidance for precise level mapping, as well as a zero-toolchange option for rapid switching between subjects. OPTORUN OTFG-1000C's advanced optics system ensures optimal photomask performance with a wide range of films, resists, developer options, and masking materials. The unit's optical radiation source is equipped with a powerful motorized vacuum machine, which prevents particulate contamination of the illumination path and thus ensures optimal image quality. The tool also contains multiple imaging modes for different resist types. In addition, OTFG-1000C allows users to choose from a variety of hot and cold bake settings depending on the desired result. Hot baking is used to increase resist adhesion strength and improve the shelf life of the produced image, while cold baking is ideal for soft bake applications for flexible substrate or semi-rigid substrates. Integrated motion control ensures positioning accuracy on the order of ±2 μm, stationary zero-alignment accuracy of 1 μm, and precision radiant exposure of less than one-tenth of a micron. The device automatically compensates for variation in film or substrate thickness and provides precise illumination and time control for consistent photoresist rendering. Overall, OPTORUN OTFG-1000C is an advanced photoresist process device offering precision and usability for a wide variety of applications. Its high tolerance to minute material thicknesses and its integrated imaging and motion control technologies make it an ideal choice for lithographic processes in a variety of industries.