Used OPTORUN OTFG-1300 #9278215 for sale

OPTORUN OTFG-1300 is a high-precision, cost-effective photoresist equipment used for advanced photolithography applications. OTFG-1300 features a proprietary optical filter system that provides superior photoresist performance and higher resolution than traditional lithography systems. The unit offers precision imaging, exposure control, and uniform photoresist development, allowing users to achieve the highest quality results in a cost-efficient manner. OPTORUN OTFG-1300 is built with a powerful optical filter machine, designed specifically for use with advanced photolithography technologies. This tool is capable of accurately and precisely filtering out non-critical wavelength bands from UV exposure, resulting in improved resolution and better imaging of surface features on photoresist material. This filter asset is also designed to reduce the impact of environmental influences, allowing for improved yield and higher quality results. The model also features advanced exposure control and uniform photoresist development. The exposure control allows users to precisely and accurately control the UV exposure levels for different applications. The recommended UV exposure time is automatically calculated for each process, ensuring optimal exposure for each process. OTFG-1300 also features uniform photoresist development capabilities, allowing users to achieve consistent, high-quality results regardless of substrate variation. In addition, the equipment comes standard with advanced features such as dual scan imaging, auto-leveling, and high-speed exposure, allowing users to reduce production time and lower production costs. OPTORUN OTFG-1300 also provides advanced process control capabilities, allowing for precise and repeatable photolithography processes. Overall, OTFG-1300 is a high-precision, cost-effective photoresist system designed for advanced photolithography applications. Featuring a proprietary optical filter unit and advanced exposure control and photoresist development capabilities, the machine can provide users with superior imaging quality and higher resolution than traditional lithography systems. With its advanced features, users can reduce production time and lower production costs, making OPTORUN OTFG-1300 an excellent choice for high-volume photolithography processes.