Used OPTOVAC MHC 60 #9212768 for sale
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ID: 9212768
Vintage: 2004
Backside coaters system
Set up for thermal cured backside spin coating
Spare parts included
2004 vintage.
OPTOVAC MHC 60 is a dry-film photoresist equipment designed for fine and ultra fine line applications. It is a single-layer direct imaging photoresist with a high resolution capability. The photoresist can be used for micro-electronic and other applications such as circuit boards, flat-panel displays, and other opto-electronic devices. The photoresist system has a unique blend of materials that provide excellent imageability with a medium-high solubility rate. This makes it well suited to fine and ultra fine line applications such as those found in micro-electronic and opto-electronic devices. The unit also has exceptional environmental resistivity and superior light transmission. The photoresist is applied in a thin, uniform layer on a suitable substrate. The application can then be exposed to ultra-violet light using a suitable light source such as a built-in pattern generator. The photoresist's solubility rate is chosen to match that of the exposed substrate; when exposed to light, the resist reacts in a predictable manner and forms a pattern of lines at a designated size and resolution. The etched pattern is then developed in a suitable developer. This will remove the areas that were not exposed to the UV light, creating a patterned, uncrosslinked resist on the surface of the substrate. The developer also helps to remove traces of undercutting that can occur during etching, ensuring a crisp and accurate etch pattern. Finally, the patterned resist is cured to obtain a strong, durable and insoluble layer. This creates a nearly impervious coating that is resistant to abrasion, corrosion and thermal variations. It is also resistant to sunlight and other environmental conditions. This helps to ensure long-term reliability for applications like circuit boards and flat-panel displays. MHC 60 is an excellent photoresist machine for fine and ultra fine line applications. Its blend of materials provides excellent imageability with a medium-high solubility rate, and its resistance to environmental exposure make it an ideal choice for micro-electronic and opto-electronic applications.
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