Used OWENS DESIGN Gen 2 #9234061 for sale

OWENS DESIGN Gen 2 photoresist equipment is a cost-effective and advanced system designed for the equipment and processes of the automated photolithography process. It is an advanced photolithography unit that is designed with the latest technological advancements. The machine consists of a high-precision multi-axis tool, a digital projection asset, powerful software tools, and a high resolution projector. This model offers high-resolution images and repeatability, superior accuracy, and an intuitive user interface. The multi-axis equipment utilizes advanced linear and angular encoders to provide precise positioning and motion control. This allows the system to accurately move the mask, wafer, and projector together or independently in the three-dimensional space of the unit. The digital projection machine is used for transferring the photolithographic pattern onto the mask or wafer. The projector is capable of providing sharp images with a resolution of up to 2560 x 1920 pixels. It features a three-lens optical tool that provides high intensity illumination and eliminates moiré patterning on the mask or wafer. The powerful software tools are easy to use and provide full control over the asset's settings. These tools include alignment tools for accurately aligning and focusing the mask or wafer. In addition, they include a range of other functions such as vectorization, compensation data input, complex photolithographic patterning, and more. Gen 2 photoresist model is designed for fast, efficient, and precise patterning. The equipment provides unmatched quality, accuracy, and repeatability. It is designed for flexible and automated processes and provides a cost-effective solution for production and prototyping.