Used PARKER MSX-102C #9247058 for sale

PARKER MSX-102C is a third-generation photoresist equipment which combines high-resolution imaging with a high-precision, repeatable process. The system utilizes a computer-controlled, gas-driven, automatic exposure unit with three primary components - the optical units, the thermal control unit, and the computerized control. The optical units consist of an excimer laser light source, beam shaping optics, and a dual imaging machine that includes a broadband spectral imaging process and a binary imaging process. The optical units support both optical and thermal control features which enable accurate and repeatable imaging of high-resolution patterns. The light source provides a wide wavelength range to match photoresist processes for exposure of different film thicknesses. The light exposure process is further enhanced by the automatic centering feature which assists in providing uniform irradiance across an entire pattern, enabling consistent imaging of high-resolution patterns in a single exposure. The thermal control unit is integrated into the optical units and ensures temperature control is maintained during patterning processes. The thermal control unit maintains a precise temperature within the unit to protect resist films, which increases process stability, as well as producing accurate patterning. The controller also incorporates a localized Nitrogen cold gas chamber to ensure temperature stability during the resist patterning process. The tool's computerized control is used to manage and control every step of the imaging process. The computer provides an array of user-friendly options for programming and controlling the entire photoresist process including data input, exposure cycles, numerical monitoring, and alignment control. It also features real-time feedback regarding patterning accuracy and process robustness, providing a complete and automated asset for development and control of advanced photoresist patterning processes. MSX-102C photoresist model is an ideal solution for manufacturers looking to increase their yield, maximize throughput, and improve their process reliability. The equipment's high-resolution imaging capabilities make it ideal for advanced microfabrication processes, and it features a wide range of programmable features to ensure complete process control. All of this combines to make PARKER MSX-102C photoresist system an invaluable tool for manufacturers seeking to maximize the accuracy and repeatability of their processes.