Used POLYTEKNIK Cryofox Explorer 600 #9189760 for sale
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ID: 9189760
Wafer Size: 8"
Vintage: 2007
Thin film coating system, 8"
(4) Pockets
Wafer load, 6"
E-beam source
No magnetrons
No water cooled substrate
Turbo pump
Roughening pump
Technical specifications:
Vacuum system, standard: TMP1: 240 l/s, TMP2: 400 l/s, RP: 35 m³/h dry pump
Base pressure: 1E^-7 mbar range
Electric supply: 3 x 400 V, 7 kVA peak
Cooling water supply: 18°C-25°C, max 6 kW cooling capacity peak
Cooling water flow: 18 L/min, 5 bar max pressure difference
2007 vintage.
POLYTEKNIK Cryofox Explorer 600 is a photoresist equipment designed to enable high quality imaging and precision etching. The system features a unique cold-etching technology that reduces the thermal conductivity of the photoresist, allowing for higher precision during etching processes. Additionally, the Explorer 600 offers a temperature controlled bake station, capable of reaching up to 130°C, advantageous for consistent results across a range of tasks. The Explorer 600 is equipped with a concise, ergonomically designed touchscreen interface and code-enabled profile customization, allowing users to access various parameters of the unit with ease. This photoresist machine features a 1.8 kW high-power CO2 laser, providing a higher quality imaging resolution than comparable resist systems. The laser is capable of patterning up to 6" substrates with a highly precise line width of ~5 µm, beneficial for applications such as packaging and prototyping. The laser also has adjustable intensity parameters—facilitating fast turnaround times for high volume production. The Explorer 600 photoresist tool also features five different types of processing recipes and a range of substrate carriers. With versatile pressure-sealing, the machine can handle any common device substrate material up to 6" in size. Enhanced safety controls in the processing chamber make it safe for operators to perform processing tasks, such as wafer mounting and alignment, in a highly controlled environment. The Explorer 600 is ideal for those requiring balanced process parameters, a high resolution imaging resolution, and the capability to pattern a range of substrates. Designed with automation and reliability in mind, the photoresist asset ensures repeatable results and comprehensive performance data. The durable construction and low maintenance requirements make the Explorer 600 an invaluable tool for users hoping to achieve maximum efficiency and high quality results.
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