Used PVA 6000 #9222892 for sale

PVA 6000 is a photoresist equipment developed by Canon that is used to create features with extremely fine resolution. It is designed for use on semiconductor wafers, and is the most advanced photoresist developed by Canon in its ultra-precise line of resist products. The major features of 6000 are its High-NA HDR imaging, compact exposure unit, and the Canon proprietary ARTechnicaG system. The High-NA HDR (High Numerical Aperture High Depth Resolution) imaging technology ensures the production of extremely fine features with superior consistency in spin-coating, imaging and etching. The compact exposure unit enables excellent performance in cleanroom environments and shorter exposure times. The ARTechnicaG unit generates a wide variety of complex patterns through easily pre-designed exposure shapes controlled by a simple interface. The machine combines the native resolution of the Canon exposure unit and photoresist tool with a 40 nanometer sub-patterning capability. PVA 6000 allows for a great degree of flexibility when making photomasks. With the ability to control the exposure area at sub-resolution levels, it is possible to create both large-scale patterns with high degree of accuracy, and dense patterns with extremely high resolution. The asset also provides the user with a wide range of exposure settings that can be tailored for a wide variety of conditions and materials. 6000 also goes one step further with its fully automated reject identification function. This function can detect defective patterns and automatically reject them, reducing errors and improving manufacturing yields. Overall, PVA 6000 is a remarkable photoresist model. Its impressive list of features, combined with Canon's long-standing reputation for quality, make it an excellent choice for semiconductor wafer feature production.