Used PVA 6000 #9241942 for sale

PVA 6000 is a photoresist equipment designed for high-precision lithography in the microelectronics industry. It is a water-soluble, two-part, novolac-based photoresist with an excellent adhesion and sensitivity profile. Its superior performance and long shelf-life make it a preferred choice for the manufacture of semiconductor devices. 6000 is composed of a main resin and a set of initiators. The resin¬†contains novolac-based acrylate ester polymers that allow strong adhesion to resists during exposure. The initiators are light-sensitive molecules that absorb energy from ultraviolet light and cause chemical reaction to depolymerize the film. This reaction in turn builds up a positive-tone image on the resist. PVA 6000 system is designed to be used in a wide range of integrated circuit (IC) lithography applications. Its thickness of 1.6 µm makes it suitable for sub-micron imaging, allowing for finer patterns and higher resolution. The unit also features excellent adhesion to a variety of substrates, ranging from silicon to dielectric layers. Additionally, its superior sensitivity, due to the combination of its chemical composition and exposure conditions, allows for top uniformity and resolution. 6000 also offers a long shelf-life, ensuring high productivity and consistent performance. Its low outgassing rate also eliminates the need for rinsing to remove unwanted surface contamination. Together with its anti-reflective coating and low-friction properties, PVA 6000 guarantees excellent image quality and repeatability. Overall, 6000 machine is an excellent choice for the production of high-precision microelectronic devices. It ensures a high-resolution, clean, low-defect image with excellent uniformity. Its long shelf-life and low outgassing rate make it highly reliable, while its superior adhesion to a variety of substrates allow for versatile applications.