Used PVA Delta 6 #9412501 for sale

PVA Delta 6 is a negative photoresist system designed for generating high-resolution patterns on a variety of surfaces, such as silicon, glass, quartz, and others. It is designed to be used along with standard pre-deposition and development techniques. The material consists of polymer-based negative photoresists, which react to exposure to ultraviolet (UV) light and produce a chemical change to the exposed area. In its standard form, Delta 6 is a viscous liquid which is applied to the substrate either as a spin-coated film, screened onto the substrate, or as a resistively patterned film. After application, the resist is exposed to UV light through a patterned mask. The intensity and size of the UV light exposure determines the chemical response of the negative resist and provides high resolution capability. The exposed areas become more soluble in the developer, and the unexposed regions (the protected areas) retain their insolubility. Once exposed, the substrate is developed in a suitable liquid developer. This removes the exposed regions of the resist, allowing the substrate's original surface to be exposed ready for further processing. Once complete, the substrate can be heat-treated to preserve the pattern stability, and further harden the resist. The advantage of using PVA Delta 6 is that the photoresist provides for patterning with very high resolution, and its sensitivity allows for creating very small features. Additionally, it provides excellent adhesion to a variety of substrates, and can be removed easily with standard stripping solvents. Therefore, Delta 6 photoresist system provides a reliable method for creating high resolution patterns on a variety of surfaces while offering high etch and process compatibility. It is easy to use, can be quickly and accurately exposed, and provides robust performance during Fabrication, dry and wet clean operations, as well as in finish g