Used PVA Delta 8 #293587055 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

Manufacturer
PVA
Model
Delta 8
ID: 293587055
Vintage: 2018
Conformal coating machine Hand cycle star Push-button Syringe supply: Air caps: 0-60 PSI With digital pressure switches (2) Motion axes: X, Y: Top Z: Bottom (4) Controller axes Head tooling: Custom Controller: 4000 X-Stroke: 621 mm Y-Stroke: 595 mm Ballscrew lead: 10 mm/Rev 1 mm/Rev (2) Z-Stroke: 90 mm Material delivery: Dispense cart Pressure vessel: (2) Gal Air requirement: 80-100 PSI Dry CFM: <10 Head 1, Head 2, Head 3, Head 4: Z-Slide Stroke adjust Atom range: 0-15 PSI SMC KALREZ O-Ring FCS300-F Top valve: Cross drilled Atom air ports on both sides Space syringe away Nipple, 3" (2) Spares Double tooled: Front to rear spacing adjustable, 3"-8" Spacing top to bottom: 9"-11.5" Guarding: Interlock doors Bellows: Metal side gap panel White light tower Process control: (2) Flow monitors TURCK M12 Conn (2) Low levels PC OIT Portal Ventilation: Minimum CFM: 600 PVA Blower Exhaust switch Flange diameter: 6" Blower exit diameter: 6" Upper side panel Material 1: Rosin-based flux material KALREZ O-Ring Hose: SSMPC / TEFLON Power supply: 208 VAC, 3 Phase, 60 Hz, 15 A 2018 vintage.
PVA Delta 8 is a photoresist system designed for advanced lithographic processes used in the semiconductor industry. It is a negative tone photoresist that enables superior pattern formation, opacity, edge resolution and high-quality line width control. Delta 8 is a three component solution that consists of a polymerizable vinyl monomer, a photoacid generator, and a photo insoluble dye dissolved in a resist solvent. The photoacid generator, when exposed to a UV light source, generates a strong acid that is capable of initiating a cationic polymerization. This acid is responsible for the etching of specific areas within the resist layer, while remaining regions of the resist remain intact. The insoluble dye is the component responsible for light absorbing capabilities. This is done through its ability to absorb ultraviolet light, as well as light at various other longer wavelength ranges. The third component, the polyvinylalcohol, serves as both a bind element and as a protective coat since it tends to retain the dye molecules within its molecular structure. This molecular structure also increases the ratio of the dissolution rate of the exposed parts of the polyvinylalcohol to the unexposed parts. The combination of these three components within the resist solvent enables PVA Delta 8 system to provide superior resolution, edge profile and superior line width control. It also exhibits excellent processing characteristics, adhesion, and low dissolution and undercut ratios. Due to its complexity, Delta 8 is ideally suited for advanced device fabrication processes, including gallium nitride semiconductor devices, and is also often used in photomasks, MEMS and fingerprint element manufacturing. It is also being used in the highly sophisticated fields of optoelectronic and flat panel display manufacturing.
There are no reviews yet