Used PVA Delta 8 #293587055 for sale
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ID: 293587055
Vintage: 2018
Conformal coating machine
Hand cycle star
Push-button
Syringe supply:
Air caps: 0-60 PSI
With digital pressure switches
(2) Motion axes:
X, Y: Top
Z: Bottom
(4) Controller axes
Head tooling: Custom
Controller: 4000
X-Stroke: 621 mm
Y-Stroke: 595 mm
Ballscrew lead:
10 mm/Rev
1 mm/Rev
(2) Z-Stroke: 90 mm
Material delivery: Dispense cart
Pressure vessel: (2) Gal
Air requirement: 80-100 PSI
Dry
CFM: <10
Head 1, Head 2, Head 3, Head 4:
Z-Slide
Stroke adjust
Atom range: 0-15 PSI
SMC
KALREZ O-Ring
FCS300-F Top valve:
Cross drilled
Atom air ports on both sides
Space syringe away
Nipple, 3"
(2) Spares
Double tooled:
Front to rear spacing adjustable, 3"-8"
Spacing top to bottom: 9"-11.5"
Guarding:
Interlock doors
Bellows: Metal side gap panel
White light tower
Process control:
(2) Flow monitors
TURCK M12 Conn
(2) Low levels
PC
OIT Portal
Ventilation:
Minimum CFM: 600
PVA Blower
Exhaust switch
Flange diameter: 6"
Blower exit diameter: 6"
Upper side panel
Material 1:
Rosin-based flux material
KALREZ O-Ring
Hose: SSMPC / TEFLON
Power supply: 208 VAC, 3 Phase, 60 Hz, 15 A
2018 vintage.
PVA Delta 8 is a photoresist system designed for advanced lithographic processes used in the semiconductor industry. It is a negative tone photoresist that enables superior pattern formation, opacity, edge resolution and high-quality line width control. Delta 8 is a three component solution that consists of a polymerizable vinyl monomer, a photoacid generator, and a photo insoluble dye dissolved in a resist solvent. The photoacid generator, when exposed to a UV light source, generates a strong acid that is capable of initiating a cationic polymerization. This acid is responsible for the etching of specific areas within the resist layer, while remaining regions of the resist remain intact. The insoluble dye is the component responsible for light absorbing capabilities. This is done through its ability to absorb ultraviolet light, as well as light at various other longer wavelength ranges. The third component, the polyvinylalcohol, serves as both a bind element and as a protective coat since it tends to retain the dye molecules within its molecular structure. This molecular structure also increases the ratio of the dissolution rate of the exposed parts of the polyvinylalcohol to the unexposed parts. The combination of these three components within the resist solvent enables PVA Delta 8 system to provide superior resolution, edge profile and superior line width control. It also exhibits excellent processing characteristics, adhesion, and low dissolution and undercut ratios. Due to its complexity, Delta 8 is ideally suited for advanced device fabrication processes, including gallium nitride semiconductor devices, and is also often used in photomasks, MEMS and fingerprint element manufacturing. It is also being used in the highly sophisticated fields of optoelectronic and flat panel display manufacturing.
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