Used PVA Delta 8 #293623207 for sale

Manufacturer
PVA
Model
Delta 8
ID: 293623207
Vintage: 2018
Conformal coating machine Hose: SSMPC / TEFLON Flux material: Rosin-based (4) Motion axes: X, Y, Z (Top), and Z (Bottom) (4) Controller axes Spare valves Controller: 4000 X-Stroke: 621 mm Ballscrew lead: 10mm/rev Y-Stroke: 595 mm Ballscrew lead: 10mm/rev (2) Z-Strokes: 90 mm Ballscrew lead: 1mm/rev Heads 1 and 2: Top and bottom valve Z-Slide FCS300-F Valve Atom air range: 0-15 PSI SMC KALREZ O-Ring Liner pressure vessel (2 Gal) Air requirement: 80-100 PSI Dry CFM: <10 KALREZ O-Ring Guarding: Interlock doors Bellows: Metal side gap panel Light tower Process control: Low level PC OIT Portal White light Ventilation: Minimum CFM: 600 PVA Blower Exhaust switch Flange diameter, 6" Blower exit diameter, 6" Upper side panel Syringe supply: (2) 30cc Air caps 0-60 PSI regulator with digital pressure switches Power supply: 120, 208-230 VAC, 3 Phase, 60 Hz, 15 A 2018 vintage.
PVA Delta 8 is a photoresist equipment which is used in photolithography processes for imaging semiconductor devices and other microelectronic structures. This photoresist system is composed of a layer of polymer material known as polyvinylalcohol (PVA) which acts as a masking agent between the device and the photoresist film. Delta 8 photoresist unit has an extremely high sensitivity to UV light and is capable of resolving feature sizes down to 8 microns. It is especially useful for devices and microelectronic structures that require extremely small feature sizes and high resolution images. PVA Delta 8 photoresist machine is made up of 4 components: a photoresist, a basecoating material, an etch resistant material, and a polymer film. The photoresist layer is patterned using UV light and serves as an imaging layer. It selectively exposes a patterned area which is developed to create an image of the desired features. The basecoating layer is a material which acts as a carrier for the photoresist layer and provides the stability required to ensure the accuracy of the imaging process. The etch resistant material protects the features during etching and can be designed to cover a wide variety of materials. Finally, the polymer film is a flexible layer that seals the imaging process and protects the structures. Delta 8 photoresist tool is suitable for digital micromirror devices (DMDs) and other devices that require extremely high resolution. The asset can be used for devices such as displays, microfluidic sensors and other MEMS. PVA Delta 8 photoresist model is an essential tool for microelectronic processes. Its high sensitivity and resolution enable the imaging of extremely small devices and structure with accurate and durable imagery. This equipment can be used for a wide variety of processes and materials, ensuring that the most exacting requirements are met.
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