Used PVA TEPLA 650 #9246616 for sale

PVA TEPLA 650 is a liquid-based photoresist equipment developed to enable the production of micro-features on the surfaces of devices and components used in microelectronics, pharmaceutical and optical industries. It is an advanced, low-cost photoresist technology which enables the imaging of photosensitive features with extremely high precision and resolution. 650 is designed to provide superior performance in a variety of imaging applications. It has a high sensitization level of up to PVA TEPLA 650 nanometres, enabling it to precisely render even the smallest micro-features, including vias, trenches, surface-mount pads and other surface-mounted elements. Its high viscosity also provides enhanced coverage, ensuring each micro-feature is accurately printed. The photoresist system is specifically designed to provide a high level of photostability and performance. It is formulated with specially designed compounds which offer excellent robustness and resistance to the environmental exposure during the photoimaging process. Furthermore, the material is designed to be thermally stable, preventing it from softening or degrading during exposure to heat. This ensures that the photoimaging process is of consistent quality even with long exposure times, enabling micro-features to be accurately printed. The photoresist is easy to apply to the substrate and is designed with quicker post-cleaning cycles to minimize downtime. It is chemically compatible with most commonly used processing agents, and is designed to be resistant to the solvents and etchants used in the lithography process. Additionally, the unit is certified to be environmentally safe and meets the most stringent standards for emissions. 650 is an advanced photoresist machine designed to enable the production of micro-features with highly accurate resolution. The photoresist has a high sensitivity and thermal stability, providing enhanced performance in a variety of imaging applications. It is also designed with excellent robustness, providing superior durability and resistance to environmental factors. Additionally, its quick post-cleaning process and compatibility with many commonly used processing agents provide an efficient and reliable photochemical tool.