Used PVA TEPLA 650 #9246617 for sale

PVA TEPLA 650 is an aqua-based, penetrating photoresist system developed for use in photoetching processes. The photoresist is a combination of a polymer and a photosensitive material, and when exposed to light, it converts non-light sensitive areas into light sensitive ones. This allows it to be used to pattern metal and other materials in a wide variety of applications, including medical and laboratory instrumentation, printed circuit boards and coated fabrications. 650 is a water-soluble resist, meaning that it can be applied and developed directly in water. It is a single step process, meaning it eliminates the need for multiple layers of coating and development. The photoresist can be applied by brush, dipping or spraying with a sprayer, and comes in two forms, a premix and a concentrate. The premix is ready to use, while the concentrate must be mixed and diluted with clean, deionized water prior to application. When using PVA TEPLA 650, it is important to protect the photoresist from moisture, light and extreme temperatures. It must be stored in a cool, dark, dry place and should not be exposed to light until it is ready to be exposed to a pattern. The photoresist should also be stirred before and during use. 650 is a light sensitive photoresist that responds to UV light. It is exposed to a resist pattern (which can be printed or pre-etched), and, upon exposure, those areas not exposed to light become cured, while those exposed remain soluble. These soluble areas can then be washed away with a developer solution. This process of exposure and development is required for any pattern desired on the substrate. The advantages of using PVA TEPLA 650 are its water solubility, easy application and low waste generation. It also offers a high resolution and features excellent adhesion, with a low lift-off rate and fast exposure time. 650 is a reliable and durable resist, and when used correctly, allows the users to achieve the desired results with good reproducibility and uniformity.