Used PVA TEPLA 650 #9261168 for sale

PVA TEPLA 650 is an innovative photoresist system designed for advanced semiconductor applications. It is a single component, pre-mixed, high contrast photoresist that is spin coated onto a silicon wafer or other substrate. The resist provides a bottom anti-reflective coating (BARC) layer that quickly and reliably enables patterning of smaller features with finer resolution. The resist is composed of polyvinyl alcohol (PVA) containing a special blend of surfactants and catalysts designed to optimize adhesion and etch characteristics. The photoresist system features high resolution capabilities and comes pre-mixed with an optimal concentration of polyvinyl alcohol, allowing for spin coating with consistency and reproducibility. The etch characteristics of the resist are optimized for maximum yield in photolithography processes, making it possible to transfer patterns with high fidelity onto wafers. 650 resist offers several performance benefits. It has a thick photoresist film and is more robust than most standard positive and negative resists. The resist's thermal shelf life is also superior, allowing it to remain stable for extended periods of time in high temperatures. It is well suited for dry etching processes and offers a higher etch resistance than other standard photolreists with similar BARC performance. Furthermore, PVA TEPLA 650 photoresist is also designed to be compatible with various processes. It has been tested to ensure a wide compatibility with different resist processes, such as deep ultraviolet (DUV) and extreme ultraviolet (EUV) lithography. It can also be used in a variety of etch processes, including deep etch, deep reactive ion etch, plasma etch and deep wet etch. 650 photoresist is an advanced solution for the semiconductor industry, providing quick, reliable and precise patterning of small features. It offers a wide compatibility with various chip-making processes and provides superior performance benefits such as extended thermal shelf life and improved etch and adhesion characteristics. The resist system is ideal for those needing a reliable tool to create high precision patterns on small feature sizes.