Used RESEARCH INSTITUTE OF CETC BG-401A #293643207 for sale

RESEARCH INSTITUTE OF CETC BG-401A is a highly advanced photoresist equipment designed to enable accurate transfer of patterns onto semiconductor and glass substrates. Photoresist is a light-sensitive material that's used to make high-precision patterns in etched devices, such as integrated circuits. It works by creating a chemical reaction when exposed to light. BG-401A streamlines the photoresist process for a range of materials, such as germanium, silicon and polyimide, with a high degree of resolution and accuracy. The system is optimized for tight tolerance imaging with high throughput in pattern imaging. It comes equipped with two parallel laser beam scan heads, each providing a continuous wave of laser energy, allowing for large scan areas to be processed quickly. The built-in image processing software performs advanced image processing to ensure patterns are accurately transferred to substrates, allowing for high yields with minimal reworking and scrap. RESEARCH INSTITUTE OF CETC BG-401A also resolves the issue of plasma-discharging, a common issue in photoresist systems that can cause inconsistent etching and irregularities. Its unique gas-dynamic focusing unit works to suppress plasma-discharging by making sure the laser beam reaches the exact spot in the resist every time. More efficient and simpler than traditional photomasks, BG-401A is a powerful alternative for patterning resists. Its arc-resistant sidewalls make sure that residues are more uniform, ensuring more reliable and repeatable device performance. Its thermodynamic features, such as its high temperature capabilities, ensure that the heated resist behaves predictably during the imaging process, delivering consistent results every time. Vertically and horizontally adjustable platform provides further flexibility, allowing substrates of varying sizes and shapes to be processed with precision. The machine is also equipped with a visualized operation interface and a multilayer quick-swap function. This function selects layers of the same material automatically and quickly, eliminating the need to manually set the pattern each time. Overall, RESEARCH INSTITUTE OF CETC BG-401A is an advanced, advanced photoresist tool designed to make the patterning process easier, faster and more reliable. With its advanced features, it provides a streamlined and cost-effective solution for fabricating high-precision patterns in devices requiring changing patterns time-to-time. It is ideal for any application that needs complex, accurate and reliable patterns to be produced.