Used RHETECH STI 280 #17375 for sale

RHETECH STI 280 is a photoresist equipment developed by RHETECH Technologies. It is a complete system including the associated software, hardware, and consumables. The unit consists of a projection assembly, a UV source, and a light sensitive mask. The projection assembly has a three-aperture design which allows for multiple layers of light sensitive mask. The UV source delivers up to 5 Watts of intense UV light which can be used to generate shadow images on the mask. The mask material is a highly specialized, consistent and stable polymer that is sensitive to UV light. The mask is designed to be used multiple times with the same performance. When exposed to UV light, the exposed areas of the mask become insoluble and non-reactive which facilitates etching. The associated software for the machine is powerful and intuitive which allows for design entry, validation and simulation of imaging processes. The software can also provide a real-time preview of the entire design in order to verify the imaging process. With this real-time preview feature, the user can adjust parameters to improve the imaging results. The software also allows for automated pattern generation. This helps reduce the time required for photomask design and improve the accuracy of the patterns generated. The consumables for the tool include the light sensitive mask which is used for exposure and development. The mask is designed to have optimal optical performance and adhesion strength. In order to optimize performance, recommended process standards must be followed such as using film designed for a specific source intensity, employing non-contact handling techniques, and using liquid developer solutions appropriate to the application. STI 280 is an advanced photoresist asset that provides a cost effective and efficient solution for small to medium-scale production. Its high performance and user friendly design make it a great choice for applications such as photolithography, printer patterns, and circuit boards. Its versatile design also makes it suitable for a wide range of imaging applications.