Used RHETECH STI 280 #9292510 for sale

RHETECH STI 280
Manufacturer
RHETECH
Model
STI 280
ID: 9292510
Wafer Size: 6"-8"
Automatic stacker system, 6"-8" Process: DI Spin and dry N2 DI and N2 for test, 6" Full control.
RHETECH STI 280 photoresist equipment is an innovative system used in the creation of semiconductor devices. This unit is composed of two parts: a wet processing machine, and a plasma etch tool. The wet processing asset utilizes a variety of liquid chemical processes for depositing, developing, and removing photoresist. The plasma etch model works to etch the photoresist in order to mold the desired design into the substrate. The purpose of the wet processing equipment is to deposit photoresist onto a substrate material. This is done through a series of chemical processes, such as spin coating, spray coating, dip coating, and vacuum deposition. These processes work together to apply an even layer of photoresist to the material. Once the photoresist has been applied to the substrate, a photomask is used to create a pattern on the photoresist. The mask is then exposed to light, and activates the photoresist where the light could reach it. The exposed areas become more soluble and can be removed with a suitable solvent. The photoresist in the unexposed areas remains untouched, and remains in its original state. The plasma etch system is then used to etch the photoresist off the substrate in order to produce the desired design. This is done by exposing the substrate to a plasma containing a suitable reactive gas. The gas reacts with the exposed photoresist to form radicals, which then etch away the photoresist in the selective areas. STI 280 photoresist unit is an important tool for fabricating semiconductor devices. This machine allows devices to be created to exact specifications, without the risk of contamination or bleedthrough. It is a reliable and affordable tool for producing the highest quality semiconductor components.
There are no reviews yet