Used S CUBED / S3 TX535C #9179981 for sale

S CUBED / S3 TX535C is a state-of-the-art photoresist equipment designed for a wide range of photo-fabrication processes. It is comprised of a powerful short-wavelength radiation source, a wafer stage for substrate positioning, and an automated handling system for the photoresist. The unit is capable of providing substrate resolution of 20nm and feature sizes of 1.0 micron. The radiation source used in S3 TX535C is an ultra-short-wavelength excimer laser, which allows for a wavelength range of 200 nanometers to 350 nanometers. The laser can generate pulses up to 460 nanoseconds in length, yielding a spatial resolution of as small as 20 nanometers. Additionally, the laser is capable of controlling the waveform of each pulse, allowing for excellent control of the intensity distribution of the laser beam. The wafer stage of S CUBED TX535C features an XYZ motorized adjustment machine and a temperature stabilization tool, which both allow for accurate and reliable substrate positioning. It also features a vibration dampening asset to ensure that the substrate remains stable during the photoresist process, and can accommodate substrates up to 8" in diameter. The automatically controlled handling model of TX535C is what helps to make the process so efficient and consistent. It loads, aligns, and unloads the photoresist via an automated robotic arm to ensure accuracy and reduce human error. The equipment is also designed to track the performance of each of its components, ensuring that they are consistently producing the desired results. In conclusion, S CUBED / S3 TX535C is an advanced photoresist system designed to offer consistent results at resolutions as small as 20 nanometers. Its combination of a short-wavelength excimer laser, an advanced wafer stage, and an automated handling unit make it a powerful tool for reliable photoresist processes.