Used SAMCO RPC-300 #9185661 for sale

Manufacturer
SAMCO
Model
RPC-300
ID: 9185661
Wafer Size: 4"
Vintage: 2011
Photoresist system, 4" 2011 vintage.
SAMCO RPC-300 is a photoresist equipment specifically designed to provide precise resist coating and developing of multiple substrates. This system offers superior performance and reliability with larger amounts of throughput. RPC-300 offers excellent resolution and uniformity of processes utilizing an in-line multi-step chamber heated to 85°C. The unit is capable of applying thin films of photoresists evenly and uniformly with automation of photomask alignment, resulting in higher yields and better precision. SAMCO RPC-300 is driven by a PLC to provide automated precision control of every step. It includes digital temperature controllers with PID feedback for precise temperature control and precise timing over wide temperature ranges. It utilizes advanced thermal control and precise resistance level of +/-0.5°C to maximize yield. The machine also has a precise liquid flow monitor and control with a digital flowmeter. This ensures the exact amount of photoresist is applied to the substrate materials with precise accuracy. RPC-300 utilizes several technologies to create high resolution imaging including spin coating, convection coating, lamination, dry film application, and washer technology. It also offers fast single pass imaging which provides quieter operation and a high level of accuracy at the same time. SAMCO RPC-300 utilizes an X, Y and theta motion for high precision imaging. Its triple-axis imaging tool provides a very accurate alignment of photomasks onto substrates. RPC-300 is also environmentally friendly, utilizing CleanAir technology to reduce atmospheric contamination. Furthermore, it has built in fire prevention features to ensure that users remain safe while operating the machine. SAMCO RPC-300 is overall a powerful asset that packs many features that provide precise resist coating and developing of various substrate materials. It offers users with a higher level of reliability, accuracy and throughput, making it an ideal choice for a photoresist systems.
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