Used SANYU SC-701C #201213 for sale

SANYU SC-701C
Manufacturer
SANYU
Model
SC-701C
ID: 201213
Sputtering system with cryogenic stage Manufactured for large-chambered JEOL 5000 or 6000-series microscopes Sputter coat and freeze specimens immediately before load-lock Carbon holder Cartridge type Number of coatings One to nineteen Coating time 0.3sec/1time Carbon 5mm dia.Five pieces made by SANYU ELECTRON provided Chamber size 160mm dia.x160mm in depth Electrodes One pair Current MAX. 70A, 12V Input power 100V, 15A, 50Hz/60Hz Evacuation system Rotary pump. 100l/min Vacuum degree 10-3 Torr Sub-systems: Bio-Rad Crytrans Controller Bio-Rad E7400 Sputtering or Evaporation Module Maxtek Thickness Monitor Hexland Temperature Control Dual pumped vacuum system.
SANYU SC-701C is a high precision photoresist equipment designed for a wide range of applications, from UV to x-ray lithography. Photoresist is an insulating material used to etch and transfer circuit patterns onto semiconductor wafers. It has a light-sensitive coating that converts light into a patterned chemical reaction which can create a desired pattern on the substrate. SC-701C is designed to provide users with outstanding performance and versatility in a compact package. It has a built-in high-resolution projector and boarder enhancement system for image accuracy. The dual-track rotation unit offers uniform exposure, with a 5-degree tilt for greater control over exposure. The machine also features a fully computerized control panel, automatic focus and adjustable exposure time. SANYU SC-701C is capable of producing extremely precise patterns, with picture cell resolution up to 1 µm. It is compatible with a wide range of photoresist materials and etching solutions, and can be used to etch semi-conductive materials such as silicon and gallium arsenide. The tool is also certified to use the latest resists from major manufacturers. SC-701C is easy to operate and maintain, making it perfect for versatile photomasking needs. Its high resolution projectors, automatic focus and adjustable exposure time provide you with the ability to quickly and accurately create photomasks for SEMI and JEDEC standards. It is compatible with conventional PMMA resists and both positive and negative processes which makes it suitable for a wide range of applications in fabrication processes such as etching and transfer. Its compact design also makes it easy to use with small and tight spaces or high-input production operations. SANYU SC-701C is an ideal photoresist asset for use in a wide range of applications, offering excellent performance, versatility and precision. Its advanced features provide you with the ability to easily create accurate patterns, as well as controlled expose times and projectors. This model will make a valuable addition to any production floor as it provides an ideal solution to complex and exacting photomasking needs.
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