Used SAUNDERS 5400S #9106451 for sale

SAUNDERS 5400S is a photoresist equipment designed to improve the precision of photomasks for various industrial purposes. It supports multiple digital lithography processes, such as process-based exposure, digital mask image transfer, dry film resist layering, and imaging optimization. It is the perfect solution for developing photomasks that deliver extremely accurate and successful results. The unit utilizes advanced photo-imaging technology which utilizes higher resolution, more stable imaging performance, and increased layer thickness for darkfield shielded regions. The exposure technologies also ensure high accuracy for image transfer, while the photoresist material allows for imaging with low defects. Additionally, the system's beam aligning technology reduces the effects of misalignment and improves image quality. 5400S offers a variety of advantages for lithography applications, including increased productivity, cost savings, improved quality, and increased reliability. For example, its high throughput allows for rapidly producing hundreds of masks in a day. This reduces costs and time, while still ensuring an excellent yield and performance. The choice between a manual and an automated processes allows the user to take advantage of improved productivity when desired. The unit permits the user to take advantage of advanced image-optics features, such as edge-enhancing technologies. This gives the user the ability to create intricate masks that require superior alignment and detail. The machine also comes with alignment beam tracking capabilities to keep the masks in focus and with uniform thicknesses. SAUNDERS 5400S is equipped with advanced diagnostic tools, such as UV/Vis spectrometry and x-ray diffraction measurements, as well as a variety of process monitoring capabilities and settings for improved lithography applications. The optional beam-tracking device also allows users to control the beam accuracy while maintaining proper focus. 5400S is is suitable for use in a range of industries, including semiconductor, medical device, opto-electronic, and chip designs. It is an ideal solution for utilizing photolithography solutions for high-precision and cost-effective photomasks. Its superior speed, precision, and scalability make it an excellent option for those looking for a photomask production tool.