Used SCL CD 200A #9352010 for sale

SCL CD 200A is a universal photoresist equipment designed for photolithography processes in the semiconductor industry. It consists of a liquid photoresist, a negative mask, a light source and a process chamber. The photoresist is a photosensitive material which is applied to a wafer and exposed to a light source with a negative mask. The mask is composed of a pattern of clear and opaque areas which allow a controlled amount of light through to the photoresist. When the photoresist is exposed to light it undergoes a chemical change in which it is either cross-linked or degraded depending on the wavelength of the light. This allows for highly precise patterning of features onto the wafer. SCL CD 200 A system features an advanced process chamber for controlling the photolithography process. It can control various parameters such as temperature, pressure, humidity, and atmosphere. This allows for a highly controlled photolithography process which delivers accurate and repeatable results. Additionally, the unit can be used for both dry and wet processing. The machine takes advantage of a liquid immersion technique in wet processing, enabling greater resolution and improved process control. The tool is capable of handling multiple substrates including photomasks, topoglass, quartz, and glass-on-quartz. It is designed to run continuous single and dual-track production runs. It uses a proprietary uniform light source to ensure consistent exposure across the wafer. The asset can be used for both positive and negative photoresists and can handle a wide range of wavelenghts from deep UV to infrared. CD 200A model provides a high level of process and performance consistency. It offers improved resolution and enhanced process control. It is a fully automated equipment and can be used for high-volume production processes. It is easy to use and maintain and is ideal for high-accuracy, cost-effective photolithography processes.