Used SCL CD 200A #9363518 for sale
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ID: 9363518
Vintage: 2002
Hard coater
(3) Cleaning tanks:
Detergent
Tap water
DI Water
(2) Varnish tanks
(2) Ovens
Robot arm
LAUDA Chiller
Color touch screen
Oven heaters with displays
Etching motor
Filters housing
DI Water system with pump
Pipes varnish
Rubber parts (Belts, bushing)
Flow box with filter
Digital conductivity meter
2002 vintage.
SCL CD 200A is a photoresist equipment designed to expose photoresist patterns on a wide range of surfaces. Photoresist is a light-sensitive coating used to create patterns in a variety of substrates, such as glass, semiconductor, or metal. This system is capable of producing patterns with extremely high accuracy and excellent repeatability. SCL CD 200 A utilizes a unique patented maskless laser imaging technique to form complex patterns. It features a 6 inch, 2K (2,048 x 2,048 pixels) laser imaging head, with a resolution of 10 microns; and an exposure area of 120 mm (4.7 inches) square. This unit offers a dynamic focus lens machine, in addition to a compact and portable design. CD 200A is equipped with an advanced touchscreen control panel, allowing for easy setup and programming. It includes features such as a pattern library and batch programming, as well as the ability to save several patterns for quick retrieval. Additionally, the tool supports a wide variety of input, output, and imaging data formats. CD 200 A is built for stability and reliability in a variety of processing conditions. It has an advanced multi-stage thermal regulation asset, which helps to ensure accuracy and stability of process parameters; as well as a secondary cooling model, which improves equipment performance. SCL CD 200A has a user-friendly design, making it easy to incorporate into a variety of photoresist processing applications. It also comes with a range of factory-calibrated masks, providing quick setup and easy maintenance. The system's easy-to-use software is also designed to reduce labor costs and maximize operational efficiency. SCL CD 200 A offers excellent accuracy and flexibility, making it a well-suited choice for a wide range of photoresist patterning needs. Its highly advanced imaging capabilities and accompanying software provide users with the perfect solution for both batch and single-substrate projects. This advanced unit is sure to meet the demands of any photoresist application, large or small.
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