Used SCL CD 400 #9022280 for sale

SCL CD 400 photoresist equipment is a powerful tool used for the production of complex semiconductor structures. It is designed to create intricate structures with small feature sizes through the precise resolution of the resists and the precise depth and width that can be achieved. The system is used in the lithographic process, whereby a light exposure and etching process is used to transfer a mask pattern onto a substrate such as a silicon wafer. CD 400 photoresist unit is composed of multiple components, including a photolithography stepper, a radiometer, a masking machine, and a heating tool. The stepper uses an imaging optics asset, which includes a light source, lenses, mirrors, and filters to accurately project the mask pattern onto the substrate. The radiometer is used to measure the amount of light exposure and to monitor exposures over multiple process runs. The masking model is composed of light filters, alignment masks, and a mask holder. Finally, the heating equipment is composed of a hotplate and an oven, which are used to accurately set and maintain the temperature of the substrate during processing. SCL CD 400 uses a photoresist that is sensitive to ultraviolet radiation. The photoresist is applied onto the substrate and the mask is projected onto it. The radiation from the light source and the imaging optics system is transmitted through the mask onto the photoresist and the resist dissolves wherever the light hits it. After exposing the pattern onto the photoresist, a post-exposure bake is done, which sets the pattern into the resist and prepares it for etching. The resists used in CD 400 have a very precise thickness capability ranging in the tens of nanometers. The imaging optics unit and radiometer have 0.5 micron resolution, which is capable of creating designs with feature sizes of up to 0.5 microns in width and depth. This allows for the creation of very intricate geometries that would be impossible using other lithography methods. SCL CD 400 photoresist machine provides a reliable and precise tool for use in semiconductor device fabrication. It is highly versatile in terms of its resolution, depth and width capabilities, and provides a powerful platform for engineers and scientists to develop increasingly complex and intricate patterns.