Used SCL CD 400 #9102037 for sale

SCL CD 400 is a photoresist equipment that is designed to produce extremely high-resolution, patterned features for a wide variety of applications, such as microchips, microelectromechanical systems, or other lithographic processes. The system consists of two main components: a light source and an exposing plate. The light source is designed to provide a wavelength range of 300-400nm, in order to produce optimal contrast and features on the photoresist layer during the exposure process. The exposing plate has a precise grid pattern on its surface that allows for accurate pattern registration when the light source is focused on the plate. CD 400's optical components consists of a focusing lens, which creates an extremely small spot size on the exposing plate surface for accurate pattern exposure. The lens is designed to focus the deep ultraviolet (DUV) lens in an even, small beam that is placed on the resist plate. The exposure light is adjusted for the desired illumination level of the photoresist. During a typical exposure process, a voltage waveform is applied to the light source to limit its intensity. Once the light source is adjusted, the substrate is placed into SCL CD 400's vacuum chamber. The exposing plate is inserted into the chamber then the photoresist plate is placed on the plate. Lastly, before the exposure, a gas of an inert gas, such as carbon dioxide, is pumped into the chamber, which diffuses the light and eliminates any optical aberrations. After the exposure, the photoresist can then be developed in a chemical solution after the substrate is removed from the vacuum chamber. After the development process, the photoresist layer will have accurately defined features that have been created by the light source from CD 400. SCL CD 400 Photoresist Unit is designed for high-resolution and simplicity of operation. The machine's light source and precise exposing plates create a high-contrast photoresist layer that can be developed with precision. The inert gas filling the vacuum chamber helps to eliminate optical aberrations and diffuses light, enabling CD 400 to create detailed features with an accuracy that rivals conventional lithographic methods.