Used SCL CD 500 AR 42 #9102796 for sale

SCL CD 500 AR 42 is an e-beam photoresist equipment engineered for use in semiconductor device fabrication processes. It is designed to create nanometer-scale features and critical dimensions on dielectric and conductive materials used in the production of integrated circuits. This system includes a multiple electron beam lithography source, a powerful measurement capability, and a software-controlled photoresist management unit. The e-beam source of CD 500 AR 42 features a resonant in-lens machine that supports high acceleration, providing the high resolution images desired for advanced lithography patterns. With its wide range of beam current densities, operating conditions can be adjusted for optimized exposure of photoresists and substrate materials. The powerful metrology capabilities of this tool includes the ability to measure dynamic focus, line/span tracking, critical dimension (CD) on the mark, and profile contours. For easy integration into automated production environments, SCL CD 500 AR 42 is equipped with an Application Programming Interface (API) and features compatibility with a variety of communication protocols. The photoresist management asset of CD 500 AR 42 provides comprehensive support for all varieties of photoresists used in device fabrication. This model includes a high accuracy, automated equipment for controlling multiple aspects of photoresist pre-treatment and post-exposure bake. It is designed to maintain an optimal window between the exposure and bake cycles, ensuring reliable and repeatable photoresist development. SCL CD 500 AR 42 is the ideal choice for any semiconductor production facility. With its robust design and high performance ability, this system offers an extremely reliable solution for producing intricate, nanometer-scale features. In addition, the built-in metrology systems allows for fast and accurate control of the exposure processes, while its photoresist management unit offers an automated, reliable solution for pre- and post-exposure applications.