Used SCL CD 500 #293614894 for sale

Manufacturer
SCL
Model
CD 500
ID: 293614894
Vintage: 2016
System 2016 vintage.
SCL CD 500 is a photoresist equipment specifically designed for use in the manufacture of complex integrated circuits, providing high precision and accuracy during the process of exposing and developing complex structures. CD 500 consists of three main components: the photomask stage, the illumination system and the projection unit. The photomask stage is a precision machined mask holder with an optical flat wafer mounted on it. It has a high degree of accuracy and stability to maintain accurate mask alignment. The illumination machine is a 6-way, 12-way or 24-way optical blade array featuring a high-power uniform light tool. The projection asset uses a Very High Numerical Aperture (VHNA) optical lens designed to have a high transmission efficiency to ensure high resolution imaging. SCL CD 500 has a completely computerized user interface, offering advanced automation in wafer mask alignment and exposure. The model can easily be programmed for the precise number of exposures, dose, and exposure cycle. It also has a powerful debugging option to ensure maximum accuracy during the entire cycle. CD 500 provides operators with an unparalleled level of precision and accuracy in the manufacture of complex integrated circuits. It features advanced lithography features such as super precise power adjustment, superior pattern uniformity, fine pitch imaging, accurate and precise pattern replication as well as die-to-die overlay simulation. Furthermore, it also integrates industry-leading image analysis tools to ensure that the expected pattern results are accurately verified and patterns can be validated before production. This equipment is designed to work with a range of photoresists and its automated process recipes can be quickly adapted to suit different material combinations. SCL CD 500 is ideal for the mass production of cutting edge application integrated circuits and provides a reliable, efficient and cost-effective solution for achieving the highest yield, saving both time and production costs. It is highly recommended for professional semiconductor fabrication facilities that require complex, cutting edge processes.
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