Used SCL CD 500 #293661305 for sale

Manufacturer
SCL
Model
CD 500
ID: 293661305
Vintage: 2004
Hard coater 2004 vintage.
SCL CD 500 is an integrated photoresist equipment designed to perform critical production applications such as resist coating and patterning of flat panel display (FPD) and semiconductor devices. It combines advanced spin coating and soft baking technology with precise wafer leveling and critical cleaning to provide highly uniform resist coatings. CD 500 is equipped with a 300mm x 300mm chamber that supports 350mm processes and wafer sizes up to 8-inch. It utilizes a high precision spin head for coating and baking up to 4,500 rpm and accommodates static wafers as well as wafers with an up to 2° off-plane tilt. The system features integrated carriers with attachment bubbling setup technology that enables fast dissolving of the photoresist with minimal debris. This allows for more precise and uniform resist coatings. The unit is also compatible with both standard and advanced photoresist materials such as electron-beam, liquid crystal resist, solid-type, and others. For resist coating, SCL CD 500 includes advanced motion for maintaining substrate and substrate chuck flatness, ensuring precisely uniform coatings. The spin head of CD 500 features a wide range of spin speed settings that allow the user to adjust the speed to suit the type and thickness of the photoresist. For patterning and etching processes, the machine offers high precision spray levels with multiple nozzles and a position accuracy of 1μm in order to ensure uniform patterning of the photoresist layer. The integrated drain valve helps to ensure proper disposal of the photoresist liquid while the integrated vacuum pump helps to minimize bubbles, forming a highly uniform and dense photoresist on the substrates. SCL CD 500 is a highly precise, automated photoresist tool that is designed to effectively deliver the highest quality results for demanding FPD and semiconductor applications. Its advanced features and technologies ensure highly uniform and clean photoresist coatings and patterns, providing consistent process results and making complex FPD applications a breeze.
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