Used SCL CD 80 #9184562 for sale

SCL CD 80 is a photoresist equipment specifically designed for the fabrication of circuit boards. It is an advanced type of photolithography which enables high-quality, high-speed circuit pattern generation. It is composed of two parts: the main exposure unit, which is a special UV exposure light source, and the resist unit, which is the photoresist materials. The exposure unit provides the exposure light needed for pattern fabrication, while the resist unit provides the photoresist material that is coated on the circuit board substrate in a pattern using photolithography. CD 80 photoresist system utilizes a high-intensity UV exposure light source, which allows for the fabrication of patterns with very fine details. This is enabled by the top-down approach in exposure, which creates patterns of photoresist exposed in contiguous layers. The high-intensity UV light allows for exposure on the ideal exposure time range for most photoresists, depending on the exposure time needed for each pattern. The amount of exposure needed is adjusted through the adjustment of exposure time and intensity, allowing for a great degree of control over the photoresist pattern. The resist unit of the unit consists of various photoresist materials that can be used in the photolithography process. This allows the manufacturer to choose the right resist material depending on the application. Photoresist is a light-sensitive material that is applied to a structuring substrate and exposed to ultraviolet (UV) light. The material becomes more soluble in a developer solution. During photolithography, the exposed resist material is removed, while the unexposed area is protected from the developer and remains on the substrate. As such, pattern fabrication is achieved by the combination of the exposure and developer processes. SCL CD 80 photoresist machine is designed for accurate and reproducible pattern generation. It is user friendly, allowing the user to easily adjust the exposure time and intensity for the desired pattern. It is also designed for a wide-range of photoresist materials, allowing for the selection of the appropriate resist material for the application. The combination of these features leads to high-quality and high-speed circuit board fabrications, as well as improved process stability, flexibility, and accuracy.