Used SCL Osmoseur #9363016 for sale

SCL Osmoseur Photoresist equipment is a top-of-the-line lithography system designed for high-end photolithography applications. The unit utilizes a vacuum-controlled, photoresist-coated chrome mask to transfer patterns of varying sizes and shapes onto the exposed surface of semiconductor substrates. The photolithography process begins with the chrome mask being exposed to light of a specific wavelength, and in this case it is filtered UV light from a mercury vapor lamp. This illuminates the pattern on the chrome mask, and the UV light then selectively exposes the photoresist coating on the substrate surface, transferring the pattern onto the substrate. The machine uses a robust, closed-loop control to ensure the substrate holder always remains at a consistent height, and provides accurate alignment of the mask and substrate even at very small scales. This allows for precise control of the exposure time and power level, and compensation for environmental factors such as temperature and humidity. The photoresist layer is removed by the tool's etching module which uses a select combination of chemicals to expose and remove the photoresist in different areas as required. This ensures that even the most intricate designs can be faithfully reproduced. The asset is highly automated, and features a user-friendly interface with multiple programming functions. Users can set parameters for different patterns, and select the desired photoresist type, type of substrate, and etch rate. The model is also designed to provide unparalleled safety for employees, with anodized refractory materialls, enclosed chamber, and hooded operation. This ensures that users are not exposed to chromium, mercury, and other harmful toxins. Overall, Osmoseur Photoresist equipment is an advanced and reliable lithography system that provides reliable and precise patterns with high levels of safety for employees. It is the perfect solution for any high-end, precision photolithography application.