Used SCL SD 3000 #9052117 for sale

Manufacturer
SCL
Model
SD 3000
ID: 9052117
Dip coating machine Class 1000 (inside the machine) Temperature: 20°c +/- 2°c Humidity: < 50% Lenses racks: (15) Racks, 28 mm, 2 x 18 lenses (5) Racks, 35 mm, 2 x 14 lenses Temperature (in the tanks): Detergent tanks: up 60º C City water rinsing tanks: Ambient temperature DI Water tanks: 38º C Liquid range of viscosity limitation: Varnish pumps: ~ 5 CP Air filters: Laminar flow inside machine Absolute EPA filter and pre filter Raw materias: Stainless steel tanks Over flow tanks Pipes FIlter Stainless steel varnish circuit Dipping speed limit: Lift out tank 7 (Di water) Dipping varnish tank (1&2) 1 mm/s (10%) to 8 mm/s (100%) Coating tank: 5º C, 10º C, 20º C Limitation – temperature & concentration: Detergent – 60º C. NaOH: up to 15% Varnish: temperature controlled by chiller, between ambient and 5º C Water: Tap water with pipe Ø 16 mm D.I water with pipe Ø 16 mm Draining PVC pipes Ø 50 mm 400 V 50/60 Hz, 3 phases + neutral + ground, 22KW.
SCL SD 3000 is a photoresist equipment designed for use in industrial applications such as microelectronics and lamination. The system uses a sophisticated electron beam to create patterns and shapes on various substrates. The unit is capable of accurately and precisely etching various materials, including steel, aluminum, and semiconductors. The etch patterns created by the machine can be used to create a wide variety of devices and products, from surface mount technology components to antennae and RFID tags. SD 3000 uses a specialized Chemical Vapor Vessel (CVV) to immerse the substrate material in photoresist. The CVV is heated to a specific temperature which causes the photoresist to become more viscous. This enables the electron beam to quickly and accurately scan the desired pattern or shape on the substrate surface. The electron beam is finely tuned to provide a high degree of precision, even for intricate shapes and detailed patterns. The electron beam is surrounded by a gas chamber which is filled with inert gases such as nitrogen, argon, and xenon. As the electron beam moves it creates an electrical arc which heats up the inert gases, and this in turn evaporates a small amount of photoresist onto the substrate material. The combination of the electric arc and the heated gases creates a plasma, which deposits the photoresist onto the substrate surface in a desired pattern. The entire process takes place within the CVV chamber, and the vapor-deposited photoresist is highly uniform and resilient. SCL SD 3000 also comes with integrated software for controlling the patterns and shapes that are created with the electron beam. This allows for quick and easy customization of the shapes and patterns being created, so that the user can create intricate shapes and detailed patterns. The software also enables easy integration into existing systems, making it easy to integrate SD 3000 into any existing production process. Overall SCL SD 3000 is a powerful and precise photoresist tool which can be used to create intricate shapes and patterns on various types of materials. The electron beam is highly accurate and provides a high degree of precision, and the integrated software allows for quick and easy customization of the shapes and patterns being created. Finally, the asset is safe and reliable, ensuring consistent results each time. As a result, SD 3000 is an invaluable tool for industrial applications such as microelectronics and lamination.
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