Used SCREEN RF-300A #9355350 for sale

SCREEN RF-300A is a wafer stepper, used for the precision alignment and exposure of complex photomasks in semiconductor manufacturing. It is characterized by an easy-to-use, robust design, paired with market-leading performance and advanced features. RF-300A has a maximum projection image size (mask size) of 484x484 mm, an exposure wavelength range of 365-442nm, and an aspherical lens for greater image resolution. It features a creative pellicle-drive equipment, allowing for the efficient and accurate alignment of complex masks with high precision. The stage is driven by a hybrid motor system with a maximum stage speed of up to 270mm/sec, allowing for a maximum mesh size of up to 30,620 x 30,620; this makes SCREEN RF-300A suitable for high-throughput production scenarios. The stepper offers multiple exposure modes, such as single-wafer, multi-wafer, slit-scanning, and reverse, to cater for diverse exposure requirements. The exposure accuracy is further increased by the use of a high precision unit alignment feature and the active-alignment-sensor machine, which ensures that images are placed accurately and precisely on the wafer. The machine also offers a unique electronic shutter, where exposure can be initiated by a trigger, while the shutter remains open. This allows exposure to be suspended, allowing re-exposure or a reset of exposure parameters, even after the exposure has been started. Additionally, RF-300A also has a built-in exposure reporting tool which logs details such as exposure time, frequency, and exposure power, ensuring reliable workflows and data traceability. The machine is designed for easy maintenance and operation, supporting various automatic maintenance functionalities and a color LCD display to monitor the exposure process. The stepper is also equipped with an internal cooling asset and an ionizer, as well as an exhaust filter, protecting the user against exposure to hazardous chemicals and particles. Overall, SCREEN RF-300A is an advanced wafer stepper, providing high-resolution imaging and exposure accuracy for semiconductor manufacturing. Along with its robust and reliable features, the stepper is ideal for high-throughput production scenarios.