Used SCREEN RF3 #293586632 for sale

SCREEN RF3 photoresist equipment is a state-of-the-art developing and exposing unit used to patternly transfer photomasks for use in the fabrication of thin film microcircuits. The system offers superior performance over traditional photolithographic processes. RF3 photolift unit features a 48 inch diameter holotablet with a robust electronic rigidization machine. This allows for high precision alignment of the resist material relative to the mask image, which has a direct effect on the resolution of the resulting patterns. This tool also offers automatic measurement of resist thickness and profile, allowing for accurate control of the development time. The photoresist process consists of aligning a photomask with a substrate, using SCREEN RF3's optical table. UV light is then shone through the mask onto the substrate, where it is absorbed and modified by the photoresist. When the photoresist is exposed, the reaction between the resist and the light produces a chemical change that creates the desired microcircuit pattern. Once exposed, the photoresist must then be developed and etched away to reveal the microcircuit pattern. RF3 asset also features an improved, irradiation-resistant photoresist. This new photoresist material has a lower coefficient of thermal expansion and higher thermal stability than traditional photoresists. This allows for less distortion during the developing and etching process, resulting in higher resolutions and higher yields. Additionally, SCREEN RF3 model is capable of measuring the thickness of the photoresist layer and the resulting pattern size, with accuracy up to 0.1 micrometers. This level of precision allows for superior performance in high-density microcircuits, where time and effort is needed to fabricate a complex circuit. Overall, RF3 photoresist equipment is a versatile tool used in the fabrication of thin film microcircuits. It offers superior performance and accuracy compared to other photolithography techniques and allows for the production of high-density, high-performance microcircuits in a cost-efficient manner.