Used SCREEN RF3 #9311026 for sale

SCREEN RF3 is a photoresist equipment that enables high precision and ultra-high accuracy micro-lithography processes. It uses an advanced software-controlled optical system, which allows for the manipulation of the lithography process to create extremely complex and tiny patterns with the highest degree of accuracy. The unit is composed of two main components; the laser scanner and the highly precise hexa-axis stage. The laser scanner allows for accurate and precise exposure of photoresist material. This laser scanning machine is equipped with a scanning head capable of working in a range from sub-micron to several hundred microns, and with a high speed of up to 1 GHz. The hexa-axis stage is equipped with an adjustable device to ensure the accurate and stable positioning of the wafer. This stage can also rotate the wafer in increments of 0.001° to 0.0015° for the creation of more intricate structures. RF3 tool is highly precise and reliable; it features automated alignment and closed-loop alignment servos for feedback control and continuous cleanroom operation. This ensures a high level of accuracy while mitigating the risk of contamination due to vibration or thermal noise. In addition, the asset is capable of producing exceptional wafer uniformity and low-noise profiles for optimal device performance and yields. It has an additional in-situ metrology option which allows for in-process monitoring and control of the photoresist process. SCREEN RF3 model provides the highest degree of accuracy and precision for photoresist processes, producing extraordinary product performance and minimized yields. This equipment is now used widely in the industry of semiconductor and nanotechnology processes.