Used SCREEN RF3S #9379824 for sale

SCREEN RF3S
Manufacturer
SCREEN
Model
RF3S
ID: 9379824
Wafer Size: 12"
Track system, 12".
SCREEN RF3S is a photoresist light-sensitive coating equipment developed by SCREEN Process Company. Photoresist is a material that changes its characteristics when exposed to light, making it highly useful in the fabrication of semiconductor devices, photonics, and printed circuit boards. RF3S system is a high-performance solution for users that require high accuracy and resolution. The unit consists of a three-layer coating structure with an aluminum reflection layer and a light-sensitive photoresist layer on top. On the bottom layer is a specially formulated block-out material, which is designed to protect the other two layers from contact with the substrate. The aluminum reflection layer reflects a mask's light pattern up to the photoresist layer, activating it and providing a clear, high-resolution pattern that's transferred to the substrate. SCREEN RF3S machine is capable of high-precision patterning, with excellent resolution and repeatability. It's suitable for patterning results with line widths of under 5 microns and can provide overlay accuracy of up to 1 micron. It's also capable of withstanding high laser power and challenging materials, including those with high-k dielectrics. The tool is relatively easy to use, with a simple coating procedure and low maintenance requirements. It works best with clean substrates and stable temperature and humidity levels, and is perfect for use with short and long-life photoresist. It's also compatible with wet processing, allowing for easy removal of photoresist and maintaining the integrity of the underlying pattern. RF3S asset is cost-effective and reliable, an ideal solution for a range of photoresist applications. It's perfect for patterning of complex, precision components and flexible enough to be used in a variety of applications. This is a powerful model that offers users optimal accuracy, resolution, and reliability in photolithography processes.
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