Used SCREEN SK-W60II-BVP #293616236 for sale

SCREEN SK-W60-BVP is a photoresist equipment designed for use in substrate processing. The system guarantees high accuracy and high throughput as well as high uniformity throughout a range of processes making it cost-efficient and reliable. This state-of-the-art photoresist unit uses a single process platform and is constructed with a Roll-to-Roll configuration that assures the highest throughput of substrates, enhancing the productivity of the user's processes. The machine is equipped with Field Mask Exposure (FME) technology, which can be used in an array of lithography processes. This uses an intense light source that has a high concentration of energy and can be applied accurately over the entire scan area of the substrate at the same time. The tool also boasts of having a high precision scanner head that can achieve resolutions as low as 8 μm. Additionally, the DPM capability allows the user to handle multiple substrates in a unified process, resulting in faster throughput and increased efficiency. The asset can work with a variety of photoresists and is capable of dispensing and patterning the material into a variety of shapes and sizes. Another aspect of this model is its ability to precisely control the thermal environment of its processing chamber to ensure the best possible substrate performance. The entire equipment is designed with economy as an advantage and is capable of controlling the energy consumption through active energy management. For safety purposes, the system offers an alarm out setting, which works in conjunction with the rescue shut-off safety feature. This feature ensures the unit shuts off when an alarm is raised, protecting the user and the process from any malfunctions or faults. Lastly, the machine is designed to be easily integrated into an existing production line, and its precise performance ensures uninterrupted operation. In conclusion, SCREEN SK-W60-BVP is a single-process photoresist tool that offers precise and reliable substrate processing, with high throughput and economies of scale. Its advanced features such as FME technology, DPM capability, precise scanner head, thermal environment control, energy management, and safety features make it a cost-efficient and reliable photoresist choice.