Used SCS FA-812-1060-1 #9157134 for sale

SCS FA-812-1060-1 is a photoresist equipment designed to provide advanced lithography capabilities for semiconductor wafer processing. It is a reliable and easy-to-use system that can be integrated into a production environment. The unit features a high-powered KrF excimer laser source, and a top-down scanning stage that supports wafer sizes up to 200mm. The laser light is split into two beams which are then separated by a defined distance and directed through a condenser lens and pinhole aperture to create the desired pattern in the photoresist material. The photomask is mounted on a motorized mask stage which is coordinated with the scanning stage to enable flexible and accurate alignment. FA-812-1060-1 features automatic parameter optimization, ensuring that process parameters are changed as needed, based on observed performance. The uniformity of the exposed photoresist across the wafer is optimized through the use of individually programmable laser power and shutter speed. In addition, the machine utilizes a high-end monitoring tool with real-time feedback to provide advanced process control and verification. Several built-in safety features are also included such as a shield between the laser and wafer loading positions, and an electronically interlocked shutter door. The shutter door is equipped with an interlock that prevents any exposures from happening if the door is open. An emergency off button is also provided for quick shut-down in case of an emergency. SCS FA-812-1060-1 is an extremely efficient and reliable photoresist asset which provides high-quality lithography results with optimal process control. With its advanced features and automated parameter optimization, the model allows for the production of world-class semiconductor wafers with minimal effort. By providing safe operation, flexibility and reliable results, FA-812-1060-1 is the perfect solution for any production environment.