Used SEIKO STX-3200 #9267514 for sale

SEIKO STX-3200 is a highly advanced photoresist equipment for the development of application-specific integrated circuits. This system was developed by SEIKO and is used in various applications such as VLSI circuit board production, semiconductor fabrication, and IC chip packaging. STX-3200 utilizes a UV and i-line (also known as deep UV) exposure unit with three-dimensional array capabilities, as well as dedicated software and hardware. SEIKO STX-3200 allows for precise exposure control with pixel-level resolution, making it ideal for circuit designs with intricate line widths and patterns. Its high-resolution optics enables maximum resolution on lines measured in microns. The machine's four-mode autofocus tool ensures that the focal point is consistent with the entire photoresist surface, eliminating hotspots. This asset also provides an optional configuration of a tri-lens model that allows for simultaneous exposure with three different wavelengths, making it ideal for high-density circuit designs. STX-3200 is supported by versatile software that is capable of creating patterns for both two- and three-dimensional designs. The equipment's compatible software can be used to achieve both parallel and upright exposures, as well as mask alignment. With a built-in traceability feature users can easily monitor every design step and ensure that the desired results are achieved. In addition to precise control over exposure operation, SEIKO STX-3200 includes advanced control functions for various photoresist processes. The system's customizable settings can be adjusted for temperature, humidity, and exposure time. These settings are critical for controlling final physical results on finished products, as any deviation can lead to results that are not optimal. STX-3200's flexibility and detail-oriented design allow it to be a valuable part of the photoresist fabrication process. It can be used to design components at the micro scale, resulting in complex patterns that cannot be reproduced using traditional photolithographic processes. With its dedicated software and hardware, this advanced photoresist unit can fulfill a wide range of circuit design needs.