Used SEMES EKPS-01 #9352140 for sale

SEMES EKPS-01 is a chemically amplified positive photoresist equipment which is used for the fabrication of integrated circuits and other associated microelectronic devices. Photoresists generally are composed of a photosensitive polymer film which is coated onto a substrate, patterned using a light source, and then developed to form a patterned image. EKPS-01 is an economical photoresist system which provides increased solution stability, improved adhesion and resolution, and improved profile over similar systems. The unit's main components are a bottom and intermediate surface layer of photoresist, a barrier layer, and a top surface layer of photoresist. The bottom surface layer is composed of a polyamideimide polymer promoting adhesion to the substrate while the intermediate and top layers of photoresist are composed of a crosslinked polyimide polymer which is designed for superior resolution and etch resistance. The barrier is composed of a polyamideimide to block oxygen/moisture intrusion. This type of construction helps to improve adhesion and allow for higher resolution patterning during device fabrication. The main advantage of this photoresist machine is its excellent resolution. SEMES EKPS-01 is capable of producing features as small as 0.1 µm, which is important for high-end circuitry applications. Additionally, the tool provides increased stability, minimizing waste in the fabrication process and saving time due to decreased cycle time. The adhesive property of EKPS-01 helps to minimize cracking or peeling during the patterning process. SEMES EKPS-01 asset offers a chemical amplification (CA) process which increases the sensitivity and speed of the exposure process while maintaining a high level of resolution. The CA process takes place through an aqueous solution and involves two components: an acid generator and a stabilizer. The acid generator increases the sensitivity at the photoactivation stage, and the stabilizer prevents premature development. This process is beneficial in that it significantly cuts down cycle time while providing improved image quality. Due to its excellent resolution, improved stability, excellent adhesion, and chemical amplification process, EKPS-01 photoresist model is an ideal choice for circuit fabrication. Its advanced features allow for improved resolution and etch-resistance, offering excellent performance in a wide range of application conditions.