Used SEMES Lozix #9270506 for sale

SEMES Lozix is a photoresist equipment used for patterning and forming components on next generation semiconductor substrates. It is comprised of a unique combination of photoactivation and lithography components that result in a highly effective and reliable lithographic process for submicron line and space patterning. The system utilizes a laser-patterned photoactivation process, with a multi-level resist development process, to form tight feature sizes with extreme precision. The photoresist unit consists of a two-step laser abduction process which starts with a patterned exposure of the substrate material to an optical radiation source. This exposure's intensity will determine the degree of activation that each exposed area of the substrate will receive. Once the desired exposure profile is achieved, the substrate material will then travel through a conveyor machine where, depending on the application needs, one of two contrasting resist layers will be developed over the previously exposed substrate. Once complete, the substrate material will move to the post solubilization stage of the process where the developed resist is allowed to solidify and a series of additional chemical etching techniques are used to pattern the substrate to the desired tolerance. The chemical etching process then removes the residual resist material in order to reveal the underlying substrate material. Lozix photoresist tool is well-suited for volume production thanks to its high accuracy and fast processing times. The laser ablation and resist development process also help to reduce contamination levels in the chamber, helping to extend product life and minimize defects. Additionally, the two-step lithography process also helps to ensure a high yield of end-products thanks to its precision and rapid speed. Overall, SEMES Lozix photoresist asset helps semiconductor manufacturers produce patterns accurately and quickly in order to reduce costs and speed up time to market, making it a valuable tool for modern microchip production.