Used SEMES Semhawk #9302263 for sale

SEMES Semhawk is a next generation photoresist equipment designed to enable the fabrication of complex, high-resolution integrated circuits. The system utilizes a higher energy beam, called an extreme ultraviolet light, to excel at producing sharp, high-contrast images. This is due to the highly energetic nature of the light beam, which allows it to break apart resist molecules that a traditional photoresist unit cannot. Due to the combination of speed and productivity, the production of complex microelectronics is now possible that were not feasible before. At the core of the machine is an electron-beam gun with Cold Field Emission (CFE) and Spectacle Lenses (SLMs) that enables the generation and manipulation of the electromagnetic radiation used for lithography. A UV laser is used for control and alignment of the CFE. The CFE then directs and modulates the UV light beam onto a resist-coated surface. This resist is selectively melted and/or hardened by the UV light, producing an image on the surface. Semhawk is highly integrated and includes features like Rapid Thermal Processing Unit to protect the photoresist from damage by rapidly heating and cooling the resist during processing. The tool is also equipped with a vacuum chamber, electrodes and a detector, which enable it to produce the intense vacuum necessary to accurately form the images on the photoresist layer. The asset is designed to be durable and efficient, and can withstand exposure to harsh UV and process environment by inclusion of abrasion-resistant and heat-resistant components. Due to its highly dense components, wiring and heat resistance, it is also able to produce images of superior quality and accuracy. The model can produce feature sizes as small as 180 nanometers and supports exposure and wafer stacking of up to 8 layers. In addition to its robust nature, the equipment includes features like an automatic pattern recognition module that can help the user optimize the imagery and reduce the risk of pattern defects. The system also makes use of built-in automatic exposure and focus control for greater accuracy. With its wide range of features and advantages, this photoresist unit is ideal for customers who are looking for a tool capable of producing images with high contrasts, clean surface and minimal pattern defects.