Used SEMES STH5320H #9298975 for sale

SEMES STH5320H is a state-of-the-art photoresist equipment used in the fabrication of microelectronic devices. The system is comprised of a light source for exposing the exposed regions of a photoresist film to an energy source, as well as other equipment used in the fabrication of various components such as wafer stages, spinner, gas manifold, and an exhaust unit. The machine is capable of processing a variety of photoresists including dry and liquid films, with various thicknesses and surface treatments. This sophisticated tool helps to ensure that only the required portions of the photoresists are exposed and developed, resulting in more accurate and precise microelectronic components. The primary components of the asset are the light source, the energy source, and the wafer stages. The light source is typically an UV light source, onto which the photoresist film is exposed. This light source can be varied in intensity, to ensure that the proper exposure is achieved depending on the type of photoresist used and the thickness of the film. The energy source is generally a vacuum source, with a vacuum range of 0.5-10 Torr. A strong vacuum is necessary in order to remove air molecules from the surface of the photoresists, allowing the exposed portions of the film to develop. Along with the energy source, the model also includes a gas manifold to provide a controlled level of gas for the development process. The wafer stages allow for precise movement of the photoresist wafer during the processing cycle. The stages enable the wafer to move across the light source and provide a smooth and uniform exposure. These stages are equipped with a repeatable, high accuracy position control, allowing for accurate etching and exposure results. Once the desired exposure has been achieved, a spinner is used to coat the developed photoresist wafer and uniformly disperse the resist onto the wafer. The equipment also includes a built in, adjustable exhaust system to ensure proper air circulation and to remove any hazardous fumes or vapours created during the photoresist processing cycle. This unit also helps to maintain a constant temperature in the photoresist processing area, maintaining optimal conditions for photoresist development. In summary, STH5320H is a powerful photoresist machine designed for the fabrication of microelectronic devices. The tool is able to accurately and precisely expose a variety of photoresist films, with various thicknesses and surface treatments. The asset includes a light source, energy source, gas manifold, wafer stages, spinner, and exhaust model, all designed to ensure proper photoresist development and a uniform application of the photoresist on the wafer. In addition, the equipment can be adjusted for optimum air circulation and temperature, providing a safe and regulated working environment.