Used SEMICON LHB-3100 #9117937 for sale

SEMICON LHB-3100 is a high-precision photoresist equipment used in the photolithography process for advanced IC-fabrication. The system is used to create etch-resistant photosensitive masks that are used to transfer a pattern onto a substrate to form structures for IC components. The key components of LHB-3100 are its high-resolution imaging unit, its resist layer coating machine, and its resist development tool. The imaging asset uses a projection lens to project the desired pattern onto the substrate in detail. The resist coating model then coats the substrate with a thin layer of photoresist, which is designed to be exposed by light. The resist development equipment uses a specialized developer to selectively etch the exposed areas of the resist mask, leaving the unexposed areas intact to form an etch-resistant protective mask. SEMICON LHB-3100 is designed to meet the needs of advanced IC fabrication, as it can achieve a minimum feature size of up to 0.8 µm with its high-resolution imaging system. It also provides superb resolution of up to 15 line pairs/millimeter, which gives a sharp level of image resolution and excellent control over the pattern generated. Additionally, the unit enables exposure times of up to 300 milliseconds, which eliminates the need for post-exposure delay. Its resist coating and development systems help to reduce micro-defects and ensure accuracy. LHB-3100 also offers several outstanding features for advanced IC fabrication such as automated load/unload of substrates, optimized overlay registration, and automated focus diagnostics. Moreover, its process control windows provide for easy process tracking and monitorng. Overall, SEMICON LHB-3100 is an excellent photoresist machine for IC fabrication, offering excellent imaging quality with a sharply resolution and accuracy, superior performance, and dependable programming. It is built with the high-end technological features crucial to the next-generation IC production and is ideal for IC-manufacturers looking for a robust and precise photolithography tool.