Used SEMITOOL 2300S #151756 for sale

SEMITOOL 2300S
Manufacturer
SEMITOOL
Model
2300S
ID: 151756
Wafer Size: Up to 12"
Spin rinse dryer, up to 12".
SEMITOOL 2300S is a photoresist equipment used for the production of microelectronic devices. It is used for the coating and developing of photoresist onto microelectronic substrates. The system is highly automated and user-friendly, providing precise and repeatable film performance with its advanced features. 2300S utilizes a low-temperature bake method that provides excellent compatibility with delicate substrates and features an automated film track configuration. Its automated film track is adjustable to accommodate a variety of substrate sizes. A set of specially designed, high-quality resist pumps allow precise application of the resist material to the substrate with each pulse. Additionally, the pressure chamber and nozzle assemblies of SEMITOOL 2300S have an adjustable height and angle adjustment, enabling precise and repeatable coating film thicknesses. The photoresist unit also features a high-precision optical machine with a short-wavelength laser that allows precise and repeatable feature resolution. This tool utilizes a proprietary advanced algorithm to eliminate the effect of dust particles and enable precise focus control. Moreover, its onboard two-speed stirring motor allows for precise viscosity control and coating uniformity. To ensure precise and repeatable film profile, 2300S utilizes advanced non-contact profilometry that accurately measures the surface profile of the substrate. Furthermore, its low-outgassing materials and sublimation-proof models serve to protect sensitive substrates and ensure quality results. SEMITOOL 2300S photoresist asset is well suited for a wide variety of applications requiring precision profile, film uniformity, fine feature control and low outgassing materials. The model's automated features enable uniform and consistent film performance for each substrate and its advanced optical equipment ensures precise and repeatable feature resolution. Furthermore, its low temperature baking method ensures compatibility with delicate substrates, making it an ideal choice for microelectronic device production.
There are no reviews yet