Used SEMITOOL 260 #82972 for sale

SEMITOOL 260 is an advanced photoresist strip equipment. It is an automated, one step, economical system for the removal of photoresist from semiconductor substrates. The unit provides precision cleaning and etching of thick (>0.25 μm), thin (<0.25 μm), or multi-layer photoresist applications with a gentle and uniform process. 260 machine employs innovative technology for precise control of the entire photoresist clean cycle, including acid concentration, rinse water temperature, hold times, and strip cycle duration. The tool is powered by a four-tank, closed-loop recirculation asset and features user-selectable cleaning and etching speeds. It utilizes an advanced, single-phase etching process, enabling superior removal of photoresist layers. SEMITOOL 260 operating software is designed to help improve cleaning performance and to minimize errors during the process. The software features a collection of customizable tools that enable the operator to optimize the clean cycle according to the specific substrate requirements. It also enables the user to automate consecutive cleans and set up periodic alarms and programmable start-up/shut-down times. The model makes it easy for operators to precisely control tap and reverse tap cycles for optimal clean results. The reverse tap cycle helps reduce residual stripper and rinse water from the wafer surface, leading to a higher quality of cleaning. The equipment also employs two closely monitored acid and clean cycle tanks, which can be used in tandem or independently. For safety purposes, 260 system is designed with an advanced safety unit. This machine features multiple sensors and monitors to enable continuous and continuous monitoring of the process parameters. The tool also utilizes an isolated cleaning chamber that prevents accidental exposures to harmful chemicals, as well as a unique acid control asset that monitors and maintains pH levels for consistent clean results. In addition to its reliable performance, SEMITOOL 260 model is also designed for ease of use. It comes with simple, straightforward operation controls and intuitive graphical user interface (GUI). The user interface makes it easy to set up and adjust parameters to suit individual applications. In addition, it has a self-cleaning feature that helps ensure the highest quality photoresist stripping results.